Atomic-order thermal nitridation of group IV semiconductors for ultra-large-scale integration

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Atomic-order thermal nitridation of group IV semiconductors for ultra-large-scale integration

One of the main requirements for ultra-large-scale integration (ULSI) is atomic-order control of process technology. Our concept of atomically controlled processing for group IV semiconductors is based on atomic-order surface reaction control in Si-based CVD epitaxial growth. On the atomic-order surface nitridation of a few nm-thick Ge/about 4 nm-thick Si0.5Ge0.5/Si(100) by NH3, it is found tha...

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ژورنال

عنوان ژورنال: Advances in Natural Sciences: Nanoscience and Nanotechnology

سال: 2014

ISSN: 2043-6262

DOI: 10.1088/2043-6262/6/1/015001